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On June 19, the Japanese Ministry of Health, Labor and Welfare (MHLW) released an amendment to the Cabinet Order on the Designation of Poisonous and Deleterious Substances, [1] adding eight substances into the Deleterious Substances List and removing three from it.
The details of changes to the List are presented in the table below.
Substance Name | CAS No. | |
Substances added into the Deleterious Substances List | Aluminum chloride and preparations containing aluminum chloride | 7446-70-0 |
Cyclohex-4-ene-1,2-dicarboxylic anhydride and preparations containing cyclohex-4-ene-1,2-dicarboxylic anhydride | 85-43-8 | |
Didecyl(dimethyl)ammonium chloride and preparations containing no less than 0.4% dodecyl (dimethyl) ammonium chloride | 7173-51-5 | |
2-(Dimethyl)aminoethanol and preparations containing no less than 3.1% 2-(Dimethyl)aminoethanol | 108-01-0 | |
Trichloro(phenyl)silane and preparations containing trichloro(phenyl)silane | 98-13-5 | |
Hexanoic acid and preparations containing no less than 11% hexanoic acid | 142-62-1 | |
Heptanoic acid and preparations containing no less than 11% heptanoic acid | 111-14-8 | |
Pentanoic acid and preparations containing no less than 11% pentanoic acid | 109-52-4 | |
Substances removed from the Deleterious Substances List | 4-(2,2-Dicyanoethene-1-yl)phenyl=2,4,5-trichlorobenzene-1-sulfonate and preparations containing 4-(2,2-Dicyanoethene-1-yl)phenyl=2,4,5-trichlorobenzene-1-sulfonate | 126980-24-3 |
Preparations containing less than 6.4% 2-(Dimethylamino)ethyl methacrylate | 2867-47-2 | |
Preparations containing less than 0.3% lithium hydroxide monohydrate | 1310-66-3 |
The new additions have taken effect on July 1, 2019 (with a grace period until September 30 this year), and the removals have come into effect upon the release of the amendment. This amendment will impact both Japanese chemical manufacturers and foreign businesses exporting such substances and their mixtures to the country, as they are subject to relevant requirements concerning labelling, SDS, registration, etc.
